How Did Low-Field NMR Help Domestic CMP Slurry Break Foreign Monopoly?
CMP, short for Chemical Mechanical Polishing, is an essential process in semiconductor wafer manufacturing and plays a critical role in achieving high-precision and high-performance wafers.The main components of CMP slurry include abrasive particles, pH adjusters, oxidizing agents, and dispersants.Low-field nuclear magnetic resonance (LF-NMR) relaxation technology can distinguish the thin layer of surface-bound solvent molecules at the solid–liquid interface between nanoparticles and the solvent. This enables the estimation of the specific surface area covered by the solvent on particle surfaces, which in turn allows for the evaluation of the dispersibility of CMP slurries and related suspension samples.
2024-03-22