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Event Name: 4th National Pharmaceutical Powder Preparation and Physical Property Characterization Technology Summit Forum
Dates: February 14-15, 2023
Location: Wanda Jiahu Hotel, Taizhou, Jiangsu
Conference Themes: Traditional Chinese Medicine production technology, API innovative processes, high-end formulation production technologies, inhalation products technology, etc.


This forum mainly focused on pharmaceutical powder/particle preparation technology and the effects of pharmaceutical powders on inhalation formulations. Invited experts included Professor Cui Fude from Shenyang Pharmaceutical University, Professor Sun Chunmeng from China Pharmaceutical University, Professor Wu Duo from Suzhou University, Professor Li Fanzhu from Zhejiang Chinese Medical University, and 19 other renowned pharmaceutical experts. Over 300 experts, scholars, technicians, and business representatives from across the country also attended the event.


Newmai Analysis was invited to present its low-field nuclear magnetic resonance technology application solutions in the pharmaceutical field at the conference.


The Nuclear Magnetic Resonance Particle Surface Property Analyzer is a dedicated instrument for particle surface property analysis.
It can be used to evaluate the dispersion, affinity, and wettability between particles and solvents in suspensions.
Pharmaceuticals:
Differences in wettability, affinity, and water absorption of APIs
Energy:
Dispersion of carbon black, carbon nanotubes, and slurries in batteries, solar panels, etc., chemical and physical states of particle surfaces
Nanotechnology:
Chemical states of nanoparticle surfaces, such as adsorption and desorption effects, changes in specific surface area, etc.
Inks, electronic materials, advanced ceramics…
Click the link below to view application cases.
Low-field nuclear magnetic resonance helps evaluate the dispersion of particles in ink.
How to measure grafting rate of nanoparticle surface modification?
How does low-field nuclear magnetic resonance help break foreign monopolies in domestic CMP polishing fluids?



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